PHOTO RESIST SPINNER

PHOTO RESIST SPINNER

INTRODUCTION

This equipment is used to coat thin, uniform layer of materials like photo resist, epoxy, paint, adhesive on substrates of glass, silicon, metal and plastic. The substrate is held on a vacuum chuck. Material to be coated is dispensed to it completely. Chuck is made to spin at a high speed. While most� of the liquid on surface is thrown off, last layer remains. It dries quickly leaving a thin, uniform coating whose thickness depends upon speed, surface tension and viscosity.

FEATURES

Photo Resist Spinner is based on a hollow shaft motor especially developed for this application. It permits mounting of vacuum chuck directly on the motor shaft, eliminating belt and its related problems of acceleration, tension and slippage. Hence, it gives trouble free service. The vacuum chuck is easily detachable for cleaning and change.

SPECIFICATIONS

Speed range 1 to 6 KRPM in 6 steps

Timer 10 - 60 secs. in 6 steps

Substrate size 75 mm maximum

Overall size H 310 x W 230 x D 250 mm

Weight of the equipment 8.3 Kgs.

�O� ring size 30 x 3 mm

Power 230 � 5% AC, 50 Hz, 100 VA

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For further information contact :

SB -113, 3RD CROSS, PEENYA INDUSTRIAL ESTATE, BANGALORE- 560058 (INDIA).

TELEFAX : +91-80-5152 5162 , E-mail : ducom@vsnl.com Web site: www.ducom.com

Specification and design are subject to change without notice